Eulitha’s photonic templates are made with its revolutionary PHABLE™ technology, which guarantees highest quality at an affordable price. Optimized silicon and quartz etching yields hole and pillar patterns with a slight positive slope that facilitates the imprint process. Standard templates with square and hexagonal lattices as well as linear gratings are available.
The applications are almost unlimited including:
- Nanoimprint process and product development
- Laser diffraction gratings
- Plasmonics
- Antireflection structures
- Wiregrid polarizers
- Sensor arrays
- Templates for crystal growth
- Research and development
PHABLE™ made Standard Patterns:
- Photonic templates are provided on 4” Silicon or Fused Silica substrates as standard
- In most cases these standard patterns can be produced on customer’s own wafers, e.g. as photoresist patterns on GaN or sapphire wafers
- In certain cases templates on other substrates, e.g. 75mm, 150mm and 200mm wafers are available upon request
- Dicing to smaller substrate sizes are available upon request
- Feature (hole or pillar) diameter is about half of the pattern pitch
- Please inquire, if other duty-cycles, e.g. small pillars or holes, are required
- Templates are manufactured upon order according to the feature height requested by the customer
- Inquire for different feature heights that exceed the maximum indicated in the product tables
- Anti-adhesion coating as well as dicing is available as an option on all NIL stamps
