Displacement Talbot Lithography (DTL) is an innovative and versatile nanofabrication technology that harnesses the Talbot effect to generate periodic nanostructures. The Talbot effect describes the self-imaging phenomenon in which a periodic pattern is reproduced at specific distances from the original object. In DTL, a mask containing the desired pattern is illuminated by a coherent light source, resulting in an interference pattern that creates the nanostructure on a photosensitive material.
DTL enables rapid, large-scale fabrication of complex, high-resolution nanostructures. This technology has garnered significant attention in fields such as photonics, electronics, and nanomedicine. Its simplicity, cost-effectiveness, and scalability make Eulitha’s Lithography solution an attractive choice for researchers and manufacturers aiming to push the boundaries of nanotechnology.