PhableS is a step-and-repeat lithography tool for wafer sizes of 300mm and beyond. The tool’s variable field size feature enables selective printing on multiple device masks. With automatic wafer and mask handling in a particle controlled mini- environment, the tool is suitable for high volume industrial production. Eulitha’s Displacement Talbot Lithography (DTL) technology enables high resolution printing near the wavelength limit in a non-contact configuration. Structures such as sub-micron period linear gratings and 2D patterns such as hexagonal and square gratings are printed with high uniformity and fidelity. The technique shares the same material and process solutions with photolithography methods that have been successfully used for semiconductor lithography for many decades.
The applications are almost unlimited including: