The PhableR tool provides unprecedented ability toprint high resolution periodic structures in a low-cost photolithography system. It is similar to a conventional mask-aligner where a photoresist coated wafer is put in proximity to a mask and exposed by a beam of UV light, but thanks to the breakthrough PHABLE exposure technology of Eulitha the resolution is no longer limited by undesired diffraction effects. Structures such as sub-micron period linear gratings and 2D patterns such as hexagonal and square lattices are printed with high uniformity and fidelity.
The applications are almost unlimited including:
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