EULITHA is making nanostructures with a state-of-the-art e-beam system (Vistec EBPG 5000ES).
The machine which is the one among the best Gaussian shaped beam tools world-wide gives us the ability to manufacture structures with resolution down to 50 nm with quick turnaround times.

The key features of the tool are:

• Electron energy of 100keV enabling exposure of the high aspect ratio structures
• Rapid exposures provided by an intelligent pattern generator
• Substrate size up to 150 mm (2″, 4″, 6″ wafers, chips, mask blanks)
• Excellent resolution, stitching and overlay accuracy
• Continuously variable writing grid for accurate exposure of periodic structures

Our capabilities:

• Leading expertise on silicon and quartz Nanoimprint template production
• Feature sizes (resolution) down to 50nm
• State-of-the art 100kV ebeam exposures
• Leading experience on ebeam writing strategies to maximize throughput and optimize pattern fidelity
• Choice of ebeam resists to fit the application requirements
• Up to 6” round, and 5” square substrates
• Optimized Silicon and Quartz etching processes for Nanoimprint template production

Download the flyer here:
Flyer