1.) Inverse lithography mask design of displacement talbot lithography enabled by optimization method 28 February 2024 • 2:45 PM – 3:05 PM PST | Convention Center, Room 210C Presented by: Zhixin (Jason) Wang

2.) 300mm+ substrate UV/DUV low-cost, reliable periodic patterning solution for high-volume manufacturing 29 February 2024 • 8:50 AM – 9:10 AM PST | Convention Center, Room 210A Presented by: Kelsey Wooley

3.) Simulating use of displacement talbot lithography for high volume AR waveguide manufacturing 29 February 2024 • 3:20 PM – 3:45 PM PST | Convention Center, Room 210C Presented by: Kelsey Wooley

See you in San Jose!

SPIE Advanced Lithography + Patterning 2024

https://lnkd.in/gk6SSQQy SPIE, the international society for optics and photonics Synopsys Photonic Solutions