The Displacement Talbot Lithography (DTL) technique developed by EULITHA AG has been used to fabricate 300 nm period gratings with a depth in the range of 20-150 nm for VCSELs.

These latest research results, published by the Institute of Semiconductors of the Chinese Academy of Sciences (CAS) in collaboration with the Institute of Physics of CAS and Guilin University of Electronic Technology, demonstrate a revolutionary method for fabricating surface-emitting grating VCSELs using our DTL-based PhableR-100 UV lithography tool, which has the potential to replace conventional but very expensive electron beam lithography!

With our most advanced PhableX and PhableS series, we are more than ready to create new sustainable alternatives in this field and support high-volume manufacturing!

Link to the research: