Joint work with Synopsys on simulating AR waveguide manufacturing, 29 January.
EULITHA AG and Synopsys Inc teams will be presenting their collaborative work on simulating AR waveguide manufacturing using Displacement talbot lithography January 29th at SPIE AR/VR/MR.
Authors: Kelsey Wooley, maryvonne chalony, Andrew Dawes, Zhixin (Jason) Wang, Harun Solak, and Larry Melvin
