Displacement Talbot Lithography (DTL) is an innovative and versatile nanofabrication technology that harnesses the Talbot effect to generate periodic nanostructures with high precision and throughput. The Talbot effect describes the self-imaging phenomenon in which a periodic pattern is reproduced at specific distances from the original object. In DTL, a mask containing the desired pattern is illuminated by a coherent light source, resulting in an interference pattern that creates the nanostructure on a photosensitive material.
Eulitha’s Lithography technology, among other techniques, also includes the implementation of DTL technology. DTL enables rapid, large-scale fabrication of complex, high-resolution nanostructures by bypassing the need for direct, sequential writing. This technology has garnered significant attention for its potential applications in fields such as photonics, electronics, and nanomedicine. Its simplicity, cost-effectiveness, and scalability make Eultitha’s Lithography solution an attractive choice for researchers and manufacturers aiming to push the boundaries of nanotechnology.