Electron Beam Lithography (EBL) is a crucial nanofabrication tool, capable of crafting intricate nanometer-scale patterns. It works similarly to an electron microscope, etching designs into an electron-sensitive resist. Although slower and costlier than other lithographic methods, EBL’s high-resolution capabilities make it invaluable for research and prototyping in fields like microelectronics and nanotechnology. EULITHA utilizes this technology, along with breakthrough EUV technology, to produce large area, high-resolution periodic nanostructures. The company operates from the Paul Scherrer Institute’s cleanrooms, employing a state-of-the-art e-beam system (Vistec EBPG 5000ES) that enables the creation of structures with a resolution as low as 20nm.
While capitalizing on its breakthrough EUV technology for producing large area, high resolution periodic nano-structures, we also serve researchers and companies who require arbitrary structures with e-beam lithography. EULITHA is making nanostructures with a state-of-the-art e-beam system (Vistec EBPG 5000ES) which is located at the cleanrooms of the Paul Scherrer Institute where EULITHA’s production takes place. The machine which is the one among the best Gaussian shaped beam tools world-wide gives us the ability to manufacture structures with resolution down to 20 nm with quick turnaround times.
The key features of the tool are:
Our capabilities:
