Eulitha's vision is to become the pre-eminent solution provider for increasing performance and efficiency of photonic devices through innovative nano-lithography technologies. Provide innovative nano-lithography solutions that unleash the potential of photonic devices through increasing their performance and efficiency.
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What is EBEAM?

Electron Beam Lithography (EBL) is a crucial nanofabrication tool, capable of crafting intricate nanometer-scale patterns. It works similarly to an electron microscope, etching designs into an electron-sensitive resist. Although slower and costlier than other lithographic methods, EBL’s high-resolution capabilities make it invaluable for research and prototyping in fields like microelectronics and nanotechnology. EULITHA utilizes this technology, along with breakthrough EUV technology, to produce large area, high-resolution periodic nanostructures. The company operates from the Paul Scherrer Institute’s cleanrooms, employing a state-of-the-art e-beam system (Vistec EBPG 5000ES) that enables the creation of structures with a resolution as low as 20nm.

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EBEAM Lithography.

While capitalizing on its breakthrough EUV technology for producing large area, high resolution periodic nano-structures, we also serve researchers and companies who require arbitrary structures with e-beam lithography. EULITHA is making nanostructures with a state-of-the-art e-beam system (Vistec EBPG 5000ES) which is located at the cleanrooms of the Paul Scherrer Institute where EULITHA’s production takes place. The machine which is the one among the best Gaussian shaped beam tools world-wide gives us the ability to manufacture structures with resolution down to 20 nm with quick turnaround times.

The key features of the tool are:

  • Electron energy of 100keV enabling exposure of the high aspect ratio structures
  • Rapid exposures provided by an intelligent pattern generator
  • Substrate size up to 150 mm (2″, 4″, 6″ wafers, chips, mask blanks)
  • Excellent resolution, stitching and overlay accuracy
  • Continuously variable writing grid for accurate exposure of periodic structures

Our capabilities:

  • Leading expertise on silicon and quartz Nanoimprint template production
  • Feature sizes (resolution) down to 20nm
  • State-of-the art 100kV ebeam exposures
  • Leading experience on ebeam writing strategies to maximize throughput and optimize pattern fidelity
  • Choice of ebeam resists to fit the application requirements
  • Up to 6” round, and 5” square substrates
  • Optimized Silicon and Quartz etching processes for Nanoimprint template production
State-of-the-art ebeam lithography system
Nano pillar array – pitch 100nm
Nano pillar array – pitch 250nm
Ebeam made line patterns
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