technology

Eulitha’s Displacement Talbot Lithography (DTL) is a new paradigm in optical lithography. It leverages the properties of light diffracted by a periodic pattern on a mask to print periodic nanostructures with unparalleled resolution and precision in a non-contact configuration.

In a DTL exposure, a periodic mask is illuminated by a coherent light source, such as a laser. This illumination produces a intricate interference pattern between the mask and substrate planes. During exposure, a substrate with photosensitive material displaces, or moves through the interference pattern, patterning the desired nanostructures with exceptional accuracy.

The process of integration by the substrate movement creates an extremely large effective depth of focus which is many orders of magnitude larger than projection tools with comparable resolution. This is particularly useful when patterning on topography, curved surfaces, or substrates that struggle with flatness.

Eulitha offers a variety of optical lithography tools purpose-built to take advantage of the DTL concept. The range of tools includes different wavelength choices such as i-line and DUV wavelengths depending on resolution needs of the application, manual R&D systems and fully automated high volume manufacturing systems.