The PhableS is a step-and-repeat lithography tool designed for larger wafer sizes, such as 200mm, 300mm, and beyond. Using the large exposure fields of displacement Talbot lithography (DTL), the PhableS tool can fill larger substrates with multiple exposures. This tool is equipped with automated wafer and mask handling within a particle-controlled environment, ideal for high-volume industrial production. It features a variable exposure field size, allowing selective printing across multiple device masks.
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Applications
Our applications span a diverse range of fields, including
OPTOELECTRONICS
DFB/DBR Lasers
VCSEL Polarizer Gratings
PCSEL Photonic Crystals
Nanowire Devices
PSS
OPTICAL COMPONENTS
Telecom Gratings
Anti-Reflective Surfaces
Wire Grid (Polarizer)
Laser Diffraction Gratings
Spectrometer Gratings
Sports optics – Reticles
XR (AR/VR/MR)
Near-Eye Waveguides
Head-Up Displays (HUD)
BIO/MEDICAL
Bio Molecular Sensors
X-Ray Imaging
COLOR/VISUAL EFFECTS
Structural Colors
Security Applications
DETAILS
More on PhableS
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PhableS FLYER
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