Designed for research and development applications, the PhableR lithography tool offers high-resolution printing of periodic structures in an affordable and compact tabletop system. Utilizing displacement Talbot lithography technology, sub-micron pitch periodic structures are printed with high uniformity and fidelity. The PhableR is a manually operated system.
The PhableR is a single exposure field platform available in UV and DUV sources and various beam sizes.
| Parameter | UV | DUV |
|---|---|---|
| Resolution (linear grating) | <125 nm half-pitch | <65 nm half-pitch |
| Wafer size | 100 mm, 150 mm; larger size on request |
|
| Mask format | 6″ | |
| Illumination uniformity | <3% | |
| Resist thickness | >1 µm | >0.1 µm |
| Operation | Manual load – automatic exposure | |
| Overlay alignment | <1 µm frontside, manual | |
| Beam size | 105 mm, 155 mm, 205 mm | |
