Optoelectronics are devices that merge optics with electronics. Eulitha’s DTL technology is able to create the complex patterns needed on semiconductors and photonic devices, enhancing the performance of optoelectronic devices used in telecommunications, lasers, photovoltaics, and more. DTL lithography supports the development of advanced and efficient solutions in optoelectronics.
DFB and DBR lasers are pivotal in telecommunications, sensing, and spectroscopy.
DFB lasers incorporate these structures to achieve stable, single-frequency outputs, which are essential for high-speed data transmission and precise sensing. Similarly, DBR lasers are used for controlled wavelength emission and enhanced power output, boosting functionality in applications from fiber optics to spectroscopic analysis. Eulitha’s DTL technology precisely crafts grating structures that enable these advanced lasers, which ensures reliability and versatility in laser performance.
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VCSEL Lasers
Eulitha’s DTL technology supports advanced VCSEL (Vertical-Cavity Surface-Emitting Laser) production, specifically for manufacturing of polarizer gratings on the VCSEL chips. With their precise sub-wavelength structures, these gratings enable emission of linearly polarized light, enhancing VCSEL performance in optical communication, sensing (e.g. LiDAR), and imaging (e.g face recognition). This technology improves signal quality and data rates and boosts overall system efficiency.
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PCSEL Lasers
Photonic Crystal Surface Emitting Lasers (PCSELs) shape light emissions by leveraging photonic crystals. These lasers, supported by Eulitha’s DTL technology, embed a light-emitting layer within a 2D photonic crystal pattern, enabling perpendicular light emission. This setup enhances energy efficiency, supports array fabrication, and allows beam steering without movement. Ideal for high-speed data communication, PCSELs benefit from DTL’s precision in crafting single-mode, low-energy, and high-modulation components.
Semiconductor nanowires, crucial for advanced electronic and optoelectronic devices like high-brightness LEDs, are developed on templates with nanoscale holes using DTL technology. This technology ensures precise and uniform creation of the necessary hole arrays on substrates like GaN, each about 100nm in diameter. Unlike nanoimprint and e-beam lithography, DTL offers incredible speed, cost-efficiency, and reliability, making it ideal for producing dense and sparse nanowire arrays. Eulitha’s DUV systems deliver the high resolution required for these applications.