Eulitha exhibits and presents at SPIE Advanced Lithography + Patterning Conference 2024 in San Jose
Eulitha exhibits and presents at SPIE Advanced Lithography + Patterning Conference 2024 in San Jose
We are excited to announce THREE Eulitha presentations at SPIE Advanced Lithography 2024. We are giving talks on
1.) Inverse lithography mask design of displacement talbot lithography enabled by optimization method 28 February 2024 • 2:45 PM – 3:05 PM PST | Convention Center, Room 210C Presented by: Zhixin (Jason) Wang
2.) 300mm+ substrate UV/DUV low-cost, reliable periodic patterning solution for high-volume manufacturing 29 February 2024 • 8:50 AM – 9:10 AM PST | Convention Center, Room 210A Presented by: Kelsey Wooley
3.) Simulating use of displacement talbot lithography for high volume AR waveguide manufacturing 29 February 2024 • 3:20 PM – 3:45 PM PST | Convention Center, Room 210C Presented by: Kelsey Wooley
See you in San Jose!
SPIE Advanced Lithography + Patterning 2024
https://lnkd.in/gk6SSQQy SPIE, the international society for optics and photonics Synopsys Photonic Solutions
