Through Eulitha’s demonstration facilities in Switzerland and China, customers can access fast and innovative patterning solutions. All lithographic patterning steps are offered in-house, from the design of a photomask to the final printing in photoresist, including the provision of custom samples for various applications.
Eulitha offers a large selection of standard patterns made upon order using its in-house photomask library.
The patterns are offered either as etched products on silicon or quartz wafers or as photoresist patterns on customer’s own wafers.
Eulitha uses its two demonstration labs in Switzerland and China to validate new photonics prototypes and applications for global customers. We aim to help customers quickly and effectively evaluate the suitability of DTL for their R&D or manufacturing needs, utilizing Eulitha’s extensive expertise and equipment capabilities.
Eulitha's demo lab services enhance the development of new production processes and products with our DTL technology. This process begins by thoroughly understanding the customer's specific patterning needs. Our skilled engineering and research teams, well-versed in various applications, closely collaborate with customer teams to devise and evaluate solutions. Eulitha’s partnerships with leading photoresists and mask manufacturers ensure access to cutting-edge lithography solutions.
Minimum patterning resolution down to ~60nm. Compatible with all standard and a large range of custom substrates.