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PRODUCTS &
SERVICES

ABOUT

Ebeam Services

EULITHA is making nanostructures with a state-of-the-art e-beam system (Vistec EBPG 5000ES).

The machine which is the one among the best Gaussian shaped beam tools world-wide gives us the ability to manufacture structures with resolution down to 50 nm with quick turnaround times.

ABOUT

Applications
The key features of the tool are:
  • Electron energy of 100keV enabling exposure of the high aspect ratio structures
  • Rapid exposures provided by an intelligent pattern generator
  • Substrate size up to 150 mm (2″, 4″, 6″ wafers, chips, mask blanks)
  • Excellent resolution, stitching and overlay accuracy
  • Continuously variable writing grid for accurate exposure of periodic structures
Our capabilities:
  • Leading expertise on silicon and quartz Nanoimprint template production
  • Feature sizes (resolution) down to 50nm
  • State-of-the art 100kV ebeam exposures
  • Leading experience on ebeam writing strategies to maximize throughput and optimize pattern fidelity
  • Choice of ebeam resists to fit the application requirements
  • Up to 6” round, and 5” square substrates
  • Optimized Silicon and Quartz etching processes for Nanoimprint template production

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