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Our Technologies are Used in Both Research and Production.
Displacement Talbot Lithography (DTL) is a promising nanofabrication method that uses the Talbot effect for creating precise nanostructures. It's efficient, scalable, and cost-effective, making it ideal for applications in photonics, electronics, and nanomedicine, thus advancing the field of nanotechnology.
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Eulitha's PHABLE™ (PHOTONICS ENABLER) technology is a unique photolithography system that enables the high-throughput, cost-effective manufacturing of periodic nanostructures. Using non-contact, proximity UV-lithography, it produces patterns with sub-micron resolution, ideal for applications in photonics and optoelectronics to just name a few.
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Electron Beam (E-Beam) lithography is a high-resolution technique used for nanofabrication. It employs a focused beam of electrons to create custom patterns on a surface covered with an electron-sensitive film. Technology remains vital for research and prototyping due to its precision.
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