Products & Services
EUV gratings
Eulitha’s EUV gratings are fabricated on thin silicon nitride mambranes using high-resolution ebeam lithography. The gratings are typically etched into a Cr film deposited on the membrane. Gratings down to a period of 80nm are available. Applications for EUV gratings include spectroscopy and EUV interference lithography.
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Details
EUV gratings

We offer the following EUV transmission diffraction gratings patterned on a silicon nitride membrane:

Period   80nm
Period 100nm
Period 200nm
Period 500nm


Download the product description here:
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Please click on the link below for an article on research performed at the Shanghai Synchrotron Radiation Facility using EUV gratings produced by Eulitha.
Large-scale uniform Au nanodisk arrays fabricated via x-ray interference lithography for reproducible and sensitive SERS substrate.

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