Eulitha’s photonic templates are made with its revolutionary PHABLE™ technology, which guarantees highest quality at an affordable price. Optimized silicon and quartz etching yields hole and pillar patterns with a slight positive slope that facilitates the imprint process. Standard templates with square and hexagonal lattices as well as linear gratings are available.

‍

The applications are almost unlimited including:

• Nanoimprint process and product development
• Laser diffraction gratings
• Plasmonics
• Antireflection structures
• Wiregrid polarizers
• Sensor arrays
• Templates for crystal growth
• Research and development

‍

PHABLE™ made Standard Patterns:

• Photonic templates are provided on 4” Silicon or Fused Silica substrates as standard
• In most cases these standard patterns can be produced on customer’s own wafers, e.g. as photoresist patterns on GaN or sapphire wafers
• In certain cases templates on other substrates, e.g. 75mm, 150mm and 200mm wafers are available upon request
• Dicing to smaller substrate sizes are available upon request
• Feature (hole or pillar) diameter is about half of the pattern pitch
• Please inquire, if other duty-cycles, e.g. small pillars or holes, are required
• Templates are manufactured upon order according to the feature height requested by the customer
• Inquire for different feature heights that exceed the maximum indicated in the product tables
• Anti-adhesion coating as well as dicing is available as an option on all NIL stamps